Article 6RWKM $825M Extreme Ultraviolet Lithography R&D Facility to Be at Albany NanoTech Complex

$825M Extreme Ultraviolet Lithography R&D Facility to Be at Albany NanoTech Complex

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from High-Performance Computing News Analysis | insideHPC on (#6RWKM)
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The ongoing generative AI revolution as we know it would not be possible without EUV technology, which is used by TSMC, Samsung, Intel and other chip manufacturers to produce the most most advanced HPC-AI ....

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