Russia outlines EUV litho chipmaking tool roadmap through 2037 — country eyes replacing DUV with EUV
by ashilov@gmail.com (Anton Shilov) from Latest from Tom's Hardware on (#70BP2)
The Russian Academy of Sciences has unveiled a 2026-2037 roadmap for domestic 11.2nm EUV lithography tools that reject ASML's architecture in favor of xenon plasma, Ru/Be mirrors, and solid-state lasers, aiming for simplified, tin-free, cost-effective alternatives.