Intel installs industry's first commercial High-NA EUV lithography tool — ASML Twinscan EXE:5200B sets the stage for 14A
by ashilov@gmail.com (Anton Shilov) from Latest from Tom's Hardware on (#727JM)
Intel has installed and qualified ASML's TWINSCAN EXE:5200B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.