Article 72MR3 LLNL, Stanford Researchers Report 3D Nanofabrication Approach for TPL Wafer-Scale Manufacturing

LLNL, Stanford Researchers Report 3D Nanofabrication Approach for TPL Wafer-Scale Manufacturing

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from Inside HPC & AI News | High-Performance Computing & Artificial Intelligence on (#72MR3)
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Researchers at Lawrence Livermore National Laboratory and Stanford University announced in December they have demonstrated a new 3D nanofabrication approach that they say transforms two-photon lithography (TPL) from a slow, lab-scale technique into a wafer-scale manufacturing tool without sacrificing submicron precision. Published inNature, the team's TPL platform uses large arrays of metalenses - engineered, ultrathin [...]

The post LLNL, Stanford Researchers Report 3D Nanofabrication Approach for TPL Wafer-Scale Manufacturing appeared first on Inside HPC & AI News | High-Performance Computing & Artificial Intelligence.

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