Breakthrough EUV lithography Technology
by Brian Wang from NextBigFuture.com on (#6SAN7)
There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake of Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that surpasses the standard in semiconductor manufacturing. EUV lithography based ...