China Will Close the Semiconductor Gap After EUV Lithography Breakthrough
by Brian Wang from NextBigFuture.com on (#72D4N)
China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They had a semiconductor Manhattan Project". The prototype was completed in early 2025 and is now undergoing testing. It occupies nearly an entire factory floor and was assembled using reverse-engineered components. Ramp-up timeline Functional for chip production around 2028. ...