TSMC reaffirmed that it will not use High-NA EUV lithography for its upcoming A16 and A14 process technologies, as Low-NA EUV tools combined with internal innovations provide sufficient scaling and performance benefits.

SK hynix is the first memory maker to assemble ASML's High-NA EUV lithography system NXE:5200B at its M16 fab in Icheon to use it for R&D of next-generation process technologies before transitioning to full High-NA-based production later this decade.