A European think tank suggests retaliatory trade measures against China, and the trigger appears to be Beijing's threat to restrict exports of gallium and germanium, two raw materials used in everything from EVs to satellites.

Intel has installed and qualified ASML's TWINSCAN EXE:5200B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV patterning for 14A process technology and onwards.